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美国OAI光刻机 5000E
详细介绍
型号5000E大面积光刻机用于基板和显示器
OAI 5000E型大面积掩光刻机是一种先进的高性能,全自动掩模对准器和曝光工具,可为大型平板应用提供超精密,**,亚微米对准和分辨率。 其灵活的设计允许在各种基材(圆形或方形)上印刷高达300mm或20“×20”。 曝光系统兼容近,中,或深紫外范围的光刻胶,并具有计算机控制的LED显微镜照明,在不太理想的观察环境中观察。
Model 5000E Large Area Mask Aligner for Substrates and Displays
The OAI Model 5000E Large Area Mask Aligner is an advanced, high-performance, fully-automated mask Aligner and exposure tool that delivers ultra precise, Topside, sub-micron alignment and resolution for large, flat panel applications. Its flexible design allows printing on various substrates - round or square - up to 300mm or 20”x20”. The exposure system is compatible with photo resist in Near, Mid, or Deep UV range, and features computer-controlled LED microscope lighting for viewing in less-than-ideal viewing environments.
FORJ
德国MicroTec—CUT4055
Spex 3636 X-Press® 实验室用自动压片机
PD-10电镜粉末制样仪
全自动切片机
YPZ-GZ110L
SPEED wave
ZYP-X60T
XHLQM-30