粉体行业在线展览
面议
608
NIL**产品
小型纳米压印机
产品简介:
Process is controlled by a programmable PLC with touch screen user interface.
User can customize process parameters.
Wafer and Mold are held by vacuum chuck
UV curable imprint polymer compatible with traditional photolithography process
工艺参数
Wafer size 4 in
Imprintable wafer area 2 in
Imprint pressure 0 - 25 PSI (upgradable to 100 PSI imprint pressure)
Mold substrate size 5 x 0.090 in
Typical imprint throughput < 5 minutes/wafer
设备尺寸及环境要求
Controller Platform
Dimension 5.8 x 16.5 x 12 in 17 x 16 x 15 in
Weight 18.5 LB 45 LB
Environment 10 - 35 C, 65% 10 - 35 C, 65%
Facility requirements
Filtered Pressure source 70 - 100 PSI
Vacuum source <-14 PSI
Power 110-220V, 2A, 50/60 Hz
Clean-room class 1000 or better
FORJ
德国MicroTec—CUT4055
Spex 3636 X-Press® 实验室用自动压片机
PD-10电镜粉末制样仪
全自动切片机
YPZ-GZ110L
SPEED wave
ZYP-X60T
XHLQM-30