粉体行业在线展览
PVT单晶生长设备
面议
山东力冠
PVT单晶生长设备
749
产品特点/Product characteristics:
♦ 提供两种工艺包
Two process packages are provided
①外形包:产出6英寸碳化硅(SiC) 单晶,外形不开裂
Shape package: 6-inch silicon carbide (SiC) single crystal is produced without cracking
②工艺包:晶型: 4H
Process package: Crystal form: 4H
电阻率:0.015~0.025ohm.cm
Resistivity: 0.015 ~ 0.025 ohm . cm
直径:150.25士0.25mm
Diameter: 150.25士0.25 mm
厚度:≥10 (Figure 2) mm
Thickness:≥10 (Figure 2) mm
微管密度:≤3ea/cm²
Microtubule density:≤3 ea/cm²
TSD:≤1000ea/cm²
♦ 温度**可达2400°C
Temperatures up to 2400°C
XRD-晶向定位
CVD 真空化学气相沉积设备
等离子体增强化学气相沉积系统CVD
自动划片机
BTF-1200C-RTP-CVD
FM-W-PDS
Gasboard-2060
Pentagon Qlll
等离子化学气相沉积系统-PECVD
定制-电浆辅助化学气相沉积系统-详情15345079037